Lithographic structurization of substrate with electron beam, used for making photo-mask, e.g. of chrome-on-glass type, uses system of electroconductive, water-insoluble lower resist layer and upper layer of electron beam resist

摘要

Lithographic structurization of a substrate with an electron beam, especially for producing photo-masks, comprises production of a resist system (1, 2) on the substrate (10) by applying electroconductive, water-insoluble lower resist layer(s) (1) and then upper resist layer(s) (2) of electron beam-sensitive photoresist. An Independent claim is also included for resist system of the specified layers (1) and (2) on a substrate, for use in an electron writing process for structurizing the substrate, especially a photo-mask.