| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam exposure apparatus to which countermeasures are implemented so that a pattern precision is not lowered by shakes of each part of the exposure apparatus. SOLUTION: Sensors 110a to 110k and electromagnetic actuators 119a to 119d are installed in respective parts of the exposure apparatus 100. Each of the sensors 110a to 110k detects the vibration in each of installed places and then perform feedback or feedforward of the detected signals to the electromagnetic actuators 119a to 119d or directly to a beam control system and indirectly to a predictor. The vibration are predicted after behavior of vibration generating sources are leaned in advance to perform feedforward control of a beam position, so that formed pattern precision is further improved. COPYRIGHT: (C)2004,JPO
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