| 摘要 |
Methods and apparatus for damping vibrations within a stage device using controllable dampers are disclosed. According to one aspect of the present invention, a method for adjusting an amount of resistance associated with a stage device which has a table, a first surface, and a coupler positioned substantially between the table and the first surface includes accelerating the table and applying a resistance between the table and the first surface when the table is accelerating. Applying the resistance includes providing a first adjustment to the coupler. The method also includes substantially removing the resistance from between the table and the first surface when the table is not accelerating, wherein the resistance is substantially removed by providing a second adjustment to the coupler. In one embodiment, the stage device further includes a first damper that is arranged to substantially damp an elastic body vibration of the wafer table.
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