发明名称 Processing method for forming thick film having improved adhesion to surface-modified substrate and apparatus thereof
摘要 Disclosed is a processing method for forming a thick film having an improved adhesion to a surface-modified substrate and an apparatus thereof enabling to form a thick film having the improved adhesion to a polymeric surface by modifying the polymeric surface to have a hydrophilic property. The method includes the steps of preparing a substrate of a polymer material, surface-modifying the substrate, forming a seed layer on the substrate, and forming the thick film on the seed layer. The apparatus includes an unloading area supplying a substrate of a polymer material, a surface treating area modifying a surface of the substrate, a seed layer formation area forming a seed layer on the surface-modified substrate, a thick film formation area forming a thick film on the seed layer, and a loading area loading the substrate.
申请公布号 US2004058088(A1) 申请公布日期 2004.03.25
申请号 US20030651956 申请日期 2003.09.02
申请人 BEAG YOUNG-WHOAN;HAN SUNG;CHO JUN-SIK;LEE CHEOL-SU;KOH SUNG-SOO;SEOK JIN-WOO 发明人 BEAG YOUNG-WHOAN;HAN SUNG;CHO JUN-SIK;LEE CHEOL-SU;KOH SUNG-SOO;SEOK JIN-WOO
分类号 C23C14/02;C23C14/20;C23C14/56;C23C18/20;C25D5/56;H05K3/38;(IPC1-7):C23C14/12;C23C14/34;C23C14/35;C23C14/46;C23C16/00;C23C28/00;C25D5/54;C25D17/00;H05H1/00 主分类号 C23C14/02
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