| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a phase shifting mask capable of reducing errors in transfer of patterns due to aberration caused by a difference in transmittance by reducing the difference between the light transmittance of the inside of a larger pattern and that of the outside of the larger pattern. <P>SOLUTION: A light shielding film 2a is disposed on a transparent substrate 1 on which a larger pattern 1a and smaller patterns 1b have been formed. The light shielding film is disposed around the smaller patterns 1b but the film is not disposed around the larger pattern 1a to expose the transparent substrate 1. The difference between the light transmittance of the inside of the larger pattern 1a and that of the periphery of the pattern 1a therefore becomes smaller than the difference in transmittance between the insides of the smaller patterns 1b and the peripheries of the patterns 1b. <P>COPYRIGHT: (C)2004,JPO |
