| 发明名称 |
APPARATUS AND METHOD FOR MANUFACTURING THIN FILM DEVICE |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a lamination type thin film device of high quality and high reliability by realizing a consistent film deposition without being affected or with being less affected by a heat catalyst. <P>SOLUTION: In a thin film device manufacturing apparatus to successively laminate at least two layers on a substrate 29 for film deposition by a hot wire CVD method, the composition of a heater to be used for the subsequent thin film deposition is different from the composition of a heater to be used for the previous thin film deposition. <P>COPYRIGHT: (C)2004,JPO</p> |
| 申请公布号 |
JP2004091821(A) |
申请公布日期 |
2004.03.25 |
| 申请号 |
JP20020251965 |
申请日期 |
2002.08.29 |
| 申请人 |
KYOCERA CORP |
发明人 |
HAYASHI HIROSHI;KAWAKAMI TETSUYA |
| 分类号 |
G03G5/08;C23C16/44;H01L21/205;H01L31/04;(IPC1-7):C23C16/44 |
主分类号 |
G03G5/08 |
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