发明名称 PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus in which a dispersion plate formed effectively for feeding active species to a sample is packaged. SOLUTION: In the plasma treatment apparatus which utilizes a plasma for treating the sample, a non-opening part 2 is provided in a middle portion of a dispersion plate 1 installed at an upper position of a sample treatment chamber 12 where a sample 14 is placed. In such a case, the area of the non-opening part 2 is from 10% to 25% of the area of the sample. Besides, a plurality of holes 3 of which the total area is from 50% to 80% of the area of the sample are located around the non-opening part 2. The surface of the dispersion plate 1 is coated with a dielectric member or an insulator member. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004095693(A) 申请公布日期 2004.03.25
申请号 JP20020252168 申请日期 2002.08.29
申请人 SHIBAURA MECHATRONICS CORP 发明人 KAJIWARA SHINJI
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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