| 摘要 |
PROBLEM TO BE SOLVED: To accelerate the operation by increasing the area of a heat receiving surface 23a of a thermostat 23 and to prevent the generation of a cool spot by extending the distance from a ceramic substrate 2. SOLUTION: A wafer heater is provided with a wafer mounting surface which is one main surface of a ceramic substrate, a resistance heating body arranged on the other main surface or the inside of the ceramic substrate, a temperature measuring means for measuring the temperature of the ceramic substrate, and a feeding part for supplying power to the resistance heating body. A thermostat for detecting overheat is arranged separated from the ceramic substrate, and the area of the heat receiving surface of the thermostat is set to 50-500mm<SP>2</SP>. COPYRIGHT: (C)2004,JPO
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