| 发明名称 |
Apparatus and method for in-situ cleaning of borosilicate (BSG) and borophosphosilicate (BPSG) films from CVD chambers |
| 摘要 |
A method for cleaning borosilicate (BSG) and borophosphosilicate (BPSG) films from CDV chambers including controlling the pressure within the chamber, introducing Ar into the chamber, introducing NF3 into the chamber, adjustably spacing a heater relative to the chamber, and adjusting the temperature within the chamber.
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| 申请公布号 |
US2004055708(A1) |
申请公布日期 |
2004.03.25 |
| 申请号 |
US20020253206 |
申请日期 |
2002.09.24 |
| 申请人 |
INFINEON TECHNOLOGIES RICHMOND, LP |
发明人 |
GOVINDARAJAN SHRINIVAS;JAIN ANKUR |
| 分类号 |
B08B7/00;C23C16/44;(IPC1-7):C25F3/30;C23F1/00 |
主分类号 |
B08B7/00 |
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