| 摘要 |
PURPOSE: To provide an exposure system which is provided with a purge structure that is capable of easily purging only an irreducible minimum space near a wafer and a reticle and prevented from adversely affecting the positioning accuracy of a stage. CONSTITUTION: The exposure system is equipped with a structure 12 supported by a vibration-proof structure 13 and a partition A23 arranged at a part of an optical path of exposure light used in the exposure system. The structure 12 and the partitions A23 are linked together with an elastic material sealing member to form a closed space, and the inside of the partitions is isolated from other spaces.
|
