发明名称 |
Anti-scatter grid or collimator and method of manufacturing the same |
摘要 |
The method involves defining the geometry of a base body (6) and forming it by a rapid prototyping technique, involving radiation-hardening layers of materials that are transmissive to the radiation of interest. The inner surfaces of the base body in through-channels (5) are coated with a material that is highly absorbent to the radiation of interest, up to a thickness which ensures substantially total absorption of incident secondary radiation. Opposing surfaces are not coated or are treated afterwards so that they do not have any absorbing coating. An Independent claim is included for a scattered-ray grid or collimator. |
申请公布号 |
EP1400982(A2) |
申请公布日期 |
2004.03.24 |
申请号 |
EP20030017797 |
申请日期 |
2003.08.04 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
HOHEISEL, MARTIN, DR.;SCHAEFER, MARTIN;SKLEBITZ, HARTMUT |
分类号 |
G01T1/20;G21K1/02;G21K1/10 |
主分类号 |
G01T1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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