发明名称 |
Exposure apparatus comprising an optical element made of an isometric crystal |
摘要 |
An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°. |
申请公布号 |
EP1399766(A2) |
申请公布日期 |
2004.03.24 |
申请号 |
EP20020736104 |
申请日期 |
2002.06.13 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TAKEUCHI, SEIJI;UNNO, YASUYUKI |
分类号 |
C30B11/00;C30B29/12;G02B1/02;G02B13/00;G03F7/20;H01L21/027 |
主分类号 |
C30B11/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|