| 摘要 |
PURPOSE: A plasma process chamber is provided to enhance the uniformity of plasma by distributing uniformly the plasma gas into the inside of a chamber. CONSTITUTION: A plasma process chamber includes a reactor tube(31), a plurality of cores(32), and an inductor coil. The reactor tube(31) is installed at an upper part within a process chamber. The reactor tube(31) includes a doughnut-shaped circular tube for forming a plasma reactor(30). A plurality of holes are uniformly formed on a lower region of the reactor tube. The reactor tube(31) is connected to one or more gas supply tube. The cores(32) are coupled to the reactor tube(31). The inductor coil is wound around the cores. The inductor coil is electrically connected to an RF power unit.
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