CLEANING APPARATUS AND METHOD OF SEMICONDUCTOR SUBSTRATE

摘要

PURPOSE: A cleaning apparatus and method of a semiconductor substrate are provided to prevent damage of the semiconductor substrate by identifying the alignment of the substrate using a sensor. CONSTITUTION: A cleaning apparatus of a semiconductor substrate includes a bath(200) for loading the semiconductor substrate and a sensor(204) formed on the bath. The sensor(204) compares an unloading image to a loading image and identifies the edge line alignment state of the semiconductor substrate. Preferably, a digital camera is used as the sensor(204).