发明名称 Semiconductor wafer position detecting system, semiconductor device fabricating facility of using the same, and wafer position detecting method thereof
摘要 It is disclosed a semiconductor wafer position detecting system, a semiconductor device fabricating facility of using the same, and a semiconductor wafer position detecting method to prevent process failure in advance prior to proceeding various processes.The structure includes a chuck plate formed with at least one or more holes at a portion thereof on which a wafer is normally and closely placed; a fluid line connected between a lower portion of each of the holes and a fluid flow device; at least one or more valves provided on the fluid line to control fluid flow in response to an opening/closing control signal; a sensor provided on the fluid line to detect a state of fluid; an output device for outputting signals in response to an output control signal; and a controller for selectively applying an opening/closing control signal and an output control signal to the valve and output device, and detecting the position state of wafer by a measurement signal applied from the sensor.
申请公布号 US6710886(B2) 申请公布日期 2004.03.23
申请号 US20010027641 申请日期 2001.12.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK IN-HAK;PARK CHUL;HAN SANG-HEE;KIM TAE-HOON
分类号 H01L21/66;G01B11/02;G01B11/03;H01L21/00;H01L21/68;(IPC1-7):G01B11/14 主分类号 H01L21/66
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