发明名称 |
Process for manufacturing integrated chemical microreactors of semiconductor material |
摘要 |
The microreactor is completely integrated and is formed by a semiconductor body having a surface and housing at least one buried channel accessible from the surface of the semiconductor body through two trenches. A heating element extends above the surface over the channel and a resist region extends above the heating element and defines an inlet reservoir and an outlet reservoir. The reservoirs are connected to the trenches and have, in cross-section, a larger area than the trenches. The outlet reservoir has a larger area than the inlet reservoir. A sensing electrode extends above the surface and inside the outlet reservoir.
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申请公布号 |
US6710311(B2) |
申请公布日期 |
2004.03.23 |
申请号 |
US20010874382 |
申请日期 |
2001.06.04 |
申请人 |
STMICROELECTRONICS S.R.L. |
发明人 |
VILLA FLAVIO;MASTROMATTEO UBALDO;BARLOCCHI GABRIELE;CATTANEO MAURO |
分类号 |
B01J19/00;B01L3/00;B01L7/00;B81B3/00;(IPC1-7):C12M1/34;G01N33/48;H05B3/02 |
主分类号 |
B01J19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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