发明名称 Process for manufacturing integrated chemical microreactors of semiconductor material
摘要 The microreactor is completely integrated and is formed by a semiconductor body having a surface and housing at least one buried channel accessible from the surface of the semiconductor body through two trenches. A heating element extends above the surface over the channel and a resist region extends above the heating element and defines an inlet reservoir and an outlet reservoir. The reservoirs are connected to the trenches and have, in cross-section, a larger area than the trenches. The outlet reservoir has a larger area than the inlet reservoir. A sensing electrode extends above the surface and inside the outlet reservoir.
申请公布号 US6710311(B2) 申请公布日期 2004.03.23
申请号 US20010874382 申请日期 2001.06.04
申请人 STMICROELECTRONICS S.R.L. 发明人 VILLA FLAVIO;MASTROMATTEO UBALDO;BARLOCCHI GABRIELE;CATTANEO MAURO
分类号 B01J19/00;B01L3/00;B01L7/00;B81B3/00;(IPC1-7):C12M1/34;G01N33/48;H05B3/02 主分类号 B01J19/00
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