发明名称 |
Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
摘要 |
A method of operating a lithographic projection apparatus including forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to the spot such that it is spaced apart from the wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.
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申请公布号 |
US6710856(B2) |
申请公布日期 |
2004.03.23 |
申请号 |
US20010943088 |
申请日期 |
2001.08.31 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER LAAN HANS;DIERICHS MARCEL;VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE;EURLINGS MARKUS FRANCISCUS ANTONIUS |
分类号 |
G01B11/00;G03F7/20;H01L21/027;(IPC1-7):G03B27/72;G03B27/68;G03B27/42;G03B27/52 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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