发明名称 Verfahren zum Herstellen einer Schutzschicht auf einem Halbleiterbauelement
摘要 <PICT:1000264/C6-C7/1> A protective layer is formed on the surface of a semi-conductor body including a PN junction by an anodic treatment in an electrolyte produced by boiling a mixture of boric acid, glycol and aqueous ammonia. In the embodiment a rectifier element consisting of a molybdenum carrier plate 2 connected by aluminium alloy 3 to a silicon wafer 4 having an alloyed-in electrode 5 of a gold antimony eutectic, is placed on a gold base plate 6 and within a hollow insulating cylinder 7, e.g. of P.T.F.E., with the electrode 5 lying within a further metallic cylinder 8 supported by distance pieces 9 of plastics material and covered by a heap of fused cane sugar 10 or a wafer of plastics material. The rectifier and sugar are then immersed in electrolyte and electrical connections made as in the Figure. Operational details for producing the required oxide film are given. The semi-conductor surface may be acid etched prior to the anodic treatment.
申请公布号 DE1184423(B) 申请公布日期 1964.12.31
申请号 DE1961S075370 申请日期 1961.08.19
申请人 SIEMENS-SCHUCKERTWERKE AKTIENGESELLSCHAFT 发明人 SCHINK DR. PHIL. NAT. NORBERT;STOIBER RUPERT
分类号 H01L21/316;H01L23/29 主分类号 H01L21/316
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