IN-SITU PLASMA ETCH FOR TERA HARD MASK MATERIALS

摘要

PURPOSE: Provided is a method for removing carbon from TERA materials, which in turn renders the TERA material etchable in a plasma chemistry compatible with a fluorine based etching system. CONSTITUTION: A TERA material is exposed to a plasma containing an effective amount of nitrogen. The nitrogen binds the carbon in the TERA material, forming volatile species and thereby removing the carbon from the TERA material. The plasma may further contain oxygen or fluorine. If the plasma contains fluorine, the plasma preferably has a F/(N+O) ratio less than 0.25 or 0.1.