HDP CVD APPARATUS HAVING MEASURER FOR INDICATING LOADING HEIGHT OF WAFER

摘要

PURPOSE: A HDP(High Density Plasma) CVD(Chemical Vapor Deposition) apparatus having a measurer for indicating loading height of a wafer is provided to enhance the accuracy of fabrication process by controlling correctly the loading height of wafer. CONSTITUTION: A HDP CVD apparatus having a measurer for indicating loading height of a wafer includes a process chamber(230), an electrostatic chuck(214), a pedestal, and a probe(220). The electrostatic chuck(214) and a wafer are loaded into the process chamber(230) or unloaded from the process chamber(230). The pedestal is connected to the electrostatic chuck(214). The probe(220) is used for stopping a rising operation of the pedestal. The probe includes a measurer for indicating the maximum rising height of the electrostatic chuck.