发明名称 |
ЛИТОГРАФИЧЕСКОЕ УСТРОЙСТВО |
摘要 |
Lithography device using a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band within this range. Each mirror (24, 26, 29) comprises a stack of layers of a first material and layers of a second material alternating with the first material. The first material has an atomic number greater than that of the second material. The thickness of pairs of adjacent layers is a monotonic function of the depth in the stack. The source (22) comprises at least one target (28) which emits the radiation by interaction with a laser beam focused on one of its faces. A part (36) of the radiation emitted from the other face is used. The invention is applicable to the manufacture of integrated circuits with a high degree of integration. |
申请公布号 |
RU2002118110(A) |
申请公布日期 |
2004.03.20 |
申请号 |
RU20020118110 |
申请日期 |
2000.12.07 |
申请人 |
КОММИССАРИАТ А Л`ЭНЕРЖИ АТОМИК (FR) |
发明人 |
БАБОННО Даниель (FR);МАРМОРЕ Реми (FR);БОННЕ Лоранс (FR) |
分类号 |
G02B5/26;G02B5/28;G03F1/24;G03F7/20;G21K5/04;H01L21/027;H05G2/00 |
主分类号 |
G02B5/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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