发明名称 INSULATOR AND PLASMA PROCESSING APPARATUS EQUIPPED WITH IT
摘要 PROBLEM TO BE SOLVED: To provide an insulator that surely secures an insulating state by preventing the grounding fault of an electrode which generates a plasma and, at the same time, has a small size and secure the strength that can cope with the manufacturing of a large-area substrate, and to provide a plasma processing apparatus provided with the insulator. SOLUTION: Insulators 40 and 50 used for supporting electrodes composed of conductors, feeding electricity to the electrodes, supplying a film forming gas to an electrode used as a gas supply electrode, or the like, are constituted to have inside members 41 and 51 directly connected to the conductors (13a) of electrodes etc., and composed of an insulating material, outside members 42 and 52 which are arranged separately from the inside members 41 and 51 so as to cover the outer peripheral sections of the members 41 and 51, and holding members 43 and 53 which are arranged between the inside members 41 and 51 and outside members 42 and 52 to hold the positional relations between the members 41 and 52 and 42 and 52. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004087581(A) 申请公布日期 2004.03.18
申请号 JP20020243422 申请日期 2002.08.23
申请人 MITSUBISHI HEAVY IND LTD 发明人 SASAGAWA EISHIRO;UENO MOICHI;OTSUBO EIICHIRO
分类号 C23C16/509;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/509
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