INLINE MONITORING EQUIPMENT FOR CONTAMINATED WAFER AND METHOD FOR MEASURING CONTAMINATION OF WAFER

摘要

PURPOSE: Inline monitoring equipment for a contaminated wafer is provided to measure contamination of the wafer within a short interval of time without making the wafer exposed to other contaminants by directly estimating the contamination in a fabricating line. CONSTITUTION: A surface optical voltage measuring apparatus(10) measures the optical voltage on a wafer before irradiation of optical energy and the optical voltage on the wafer after the irradiation of the optical energy so as to determine the contamination degree of the wafer. An optical activating apparatus(20) irradiates the optical energy to the surface of the wafer to optically activate the surface of the wafer. A wafer transfer unit(32) transfers the wafer between the surface optical voltage measuring apparatus and the optical activating apparatus.