| 摘要 |
PROBLEM TO BE SOLVED: To discharge effectively trash or the like in processing liquid and process a substrate with high cleanliness factor, and prevent mutual contamination by discharging process liquid, while supplying cleaning liquid to the inner wall of a processing tank. SOLUTION: When the cleaning liquid is supplied from a washing nozzle 15, the cleaning liquid is supplied directed toward the inner wall of the processing tank, so that the process liquid pulled by an upper part on the processing tank 3 inner wall with surface tension is made to flow down in the tank 3. It follows that the process liquid in which dust, contaminants, etc. are contained can be discharged effectively, and dust, contaminants can be prevented from adhering to the processing tank 3 inner wall. As a result, the substrate W can be processes with high cleanliness factor, and mutual contamination can be prevented. COPYRIGHT: (C)2004,JPO
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