GAS CLEANING DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM

摘要

A gas cleaning device (15) used for the working space of a semiconductor processing system, comprising a member (19) for specifying a gas passage communicating with the working space (5), wherein a blower (16) for feeding gas is arranged in the gas passage, the blower (16) has characteristics to generate an inplane non-uniform air velocity distribution in a cross section perpendicular to a gas feeding direction, a straightening member (18) is disposed in the gas passage so as to be positioned on the upstream or downstream side of the blower (16), the straightening member (18) has an inplane non-uniform opening rate set so as to compensate the inplane non-uniform air velocity distribution of the blower, the position of the straightening member (18) with a low opening rate corresponds to the position of the blower (16) with a high air velocity, a filter part (17) is disposed in the gas passage so as to be positioned on the downstream side of the air blower (16) and the straightening member (18), and the filter part (17) has a function to remove particles in the gas.