| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To wash a mask efficiently without requiring a separate washing space nor causing significant cost increase for mask washing. <P>SOLUTION: In an exposure device, a mask pattern formed on a stencil mask 32 is transferred on a resist layer on a wafer 30. An ultraviolet ray (UV) lamp 46 is arranged in a mask load lock chamber 40 which is connected to a main chamber 22 of the exposure device to temporarily hold the stencil mask 32 transported in/out of the main chamber 22. Hydrocarbon contamination sticking to the stencil mask 32 transported from the main chamber 22 to the mask load lock chamber 40 is eliminated by burning with the UV lamp 46. <P>COPYRIGHT: (C)2004,JPO</p> |
