发明名称 |
Projection optical system, exposure device using said projection optical system, and exposure method using said exposure device |
摘要 |
A projection optical system of an exposure device controls spherical aberrations in optical elements by providing optical elements with an aspherical surface shape corrected in accordance with a non-even function Z=g(h) having a derivative that becomes zero on a rotation axis of the aspheric surface.
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申请公布号 |
US2004051852(A1) |
申请公布日期 |
2004.03.18 |
申请号 |
US20030606109 |
申请日期 |
2003.06.26 |
申请人 |
NIKON CORPORATION |
发明人 |
KOMATSUDA HIDEKI |
分类号 |
G02B13/18;G02B17/00;G03F7/20;H01L21/027;(IPC1-7):G03B21/28 |
主分类号 |
G02B13/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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