发明名称 |
Protective film for FPD, vapor deposition material for protective film and its production method, FPD, and manufacturing device for FPD protective film |
摘要 |
A vapor deposited material for FPD protective film comprises a polycrystalline body, sintered body, or single crystal having a surface covered with a fluoride layer. A manufacturing device for FPD protective film comprises: a film formation section for forming a film body on one side of a substrate, and a layer formation section for forming a fluoride layer on a surface of said film body; wherein said layer formation section comprises: a layer formation chamber for housing a substrate on which said film body is formed, a gas supply mechanism for forming a fluoride layer on the surface of said film body by supplying a fluoridation agent towards said substrate in said layer formation chamber, and a substrate heating section provided in said layer formation chamber for heating said substrate.
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申请公布号 |
US2004053081(A1) |
申请公布日期 |
2004.03.18 |
申请号 |
US20030642618 |
申请日期 |
2003.08.19 |
申请人 |
MITSUBISHI MATERIALS CORPORATION |
发明人 |
SAKURAI HIDEAKI;KUROMITSU YOSHIROU |
分类号 |
H01J17/02;C03C17/22;C03C17/34;C04B35/01;C04B35/03;C04B35/057;C04B35/50;C04B35/505;C04B35/553;C04B41/50;C04B41/85;C23C14/06;C23C14/24;H01J9/20;(IPC1-7):B32B9/00 |
主分类号 |
H01J17/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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