| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fine grating suitable as an antireflection structure and a manufacturing method therefor. <P>SOLUTION: When fine conical or pyramidal projections are arrayed two-dimensionally on a substrate, the arrangement period is varied with a fundamental period as the center or the height of the projections is varied, so that the influence of diffraction of light can be reduced to form an ideal antireflection structure. In order to write patterns having the arrangement period varied, periodic pattern data are used to form patterns having the period varied by superposing a minute variation signal on the deflector of an electron beam exposure device. <P>COPYRIGHT: (C)2004,JPO |
