发明名称 PHOTOCURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PATTERN FORMATION USING IT
摘要 <P>PROBLEM TO BE SOLVED: To provide a photocurable composition capable of being fully cured at a low temperature and in a short time and useful for making a color filter by applying on a plastic substrate and a method for pattern formation by using it. <P>SOLUTION: This photocurable composition comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator and a solvent. A photocured film of the photocurable composition is formed on the plastic substrate directly or through another layer. The alkali-soluble resin has a polymerizable double bond, and the photocurable composition further comprises an organic peroxide, or the organic peroxide and a thermal polymerization crosslinking agent. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004083754(A) 申请公布日期 2004.03.18
申请号 JP20020247028 申请日期 2002.08.27
申请人 FUJIFILM ARCH CO LTD 发明人 YOSHIMOTO YASUBUMI
分类号 G03F7/004;C08F2/50;C08F290/00;C08J7/04;G02F1/1335;G03F7/031 主分类号 G03F7/004
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