IMAGE FORMING MATERIAL HAVING BLUE-VIOLET LASER PHOTOSENSITIVE RESIST MATERIAL LAYER AND METHOD FOR FORMING RESIST IMAGE

摘要

PROBLEM TO BE SOLVED: To provide an image forming material having a blue-violet laser photosensitive resist material layer which is highly sensitive to laser light in a blue-violet region and excellent in safe-light property for a yellow lamp, and which causes no decrease in the sensitivity when the film thickness is increased, and further to provide a method for forming a resist image.

SOLUTION: The image forming material having a blue-violet laser photosensitive resist material layer has a blue-violet laser photosensitive resist material layer on a processed substrate and has a protective layer thereon. The photosensitive resist layer has the maximum peak in the spectral sensitivity in the wavelength region from 390 to 430 nm and ≤10,000 μJ/cm2minimum exposure dose [S410] capable of image forming at 410 nm wavelength, with ≤0.1 ratio [S410/S450] of the minimum exposure dose [S410] capable of image forming at 410 nm wavelength to the minimum exposure dose [S450(μJ/cm2)] capable of image forming at 450 nm wavelength. The resist image is formed by scanning the photosensitive resist material layer of the image forming material with laser light at 390 to 430 nm wavelength for exposure thereto, and then developing it.

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