发明名称 A METHOD FOR DEPOSITING A FILM ON A SUBSTRATE
摘要 <p>A process for depositing a layer of product on at least part of a major surface of a substrate having two sides separated by a thickness of less than about 3 mm is provided. The process involves using an immersion technique, in which the substrate is placed in a liquid medium containing a solution or dispersion of the product to be deposited or one of its precursors; removed from the liquid medium such that the substrate is coated with a liquid layer, and at least part of the liquid medium contained in the deposited liquid layer is evaporated, wherein the process is characterized as being carried out under conditions in which cooling of the substrate as a result of evaporation of said part of the liquid medium is limited.</p>
申请公布号 WO2004022248(A1) 申请公布日期 2004.03.18
申请号 WO2003US27546 申请日期 2003.09.03
申请人 CORNING INCORPORATED 发明人 GUZMAN, GUILLAUME;PUTZ, JORG;AEGERTER, MICHEL A
分类号 B05D1/18;B05D3/02;C03C17/00;C03C17/25;C23C18/12;H01L31/18;H01L51/00;(IPC1-7):B05D1/18;B05D5/06;B05D1/36 主分类号 B05D1/18
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