发明名称 |
METHOD FOR FORMING HARD CARBON NITRIDE FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a hard carbon nitride film which makes the hardness of the film higher than the hardness of a DLC (Diamond-like Carbon) film and can make a deposition rate higher. <P>SOLUTION: The method for forming the hard carbon nitride film on the surface of a material to be treated comprises heating and sublimating raw material hydrocarbons by utilizing a hollow cathode discharge within a process chamber while introducing nitrogen gas into the process chamber and forming the hard carbon nitride film by vapor deposition on the surface of the material to be treated. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004084005(A) |
申请公布日期 |
2004.03.18 |
申请号 |
JP20020247013 |
申请日期 |
2002.08.27 |
申请人 |
ULVAC JAPAN LTD |
发明人 |
NOZUE TATSUHIRO;INAGAWA KONOSUKE |
分类号 |
C01B31/30;C23C14/06;C23C14/32 |
主分类号 |
C01B31/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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