发明名称 METHOD FOR FORMING HARD CARBON NITRIDE FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a hard carbon nitride film which makes the hardness of the film higher than the hardness of a DLC (Diamond-like Carbon) film and can make a deposition rate higher. <P>SOLUTION: The method for forming the hard carbon nitride film on the surface of a material to be treated comprises heating and sublimating raw material hydrocarbons by utilizing a hollow cathode discharge within a process chamber while introducing nitrogen gas into the process chamber and forming the hard carbon nitride film by vapor deposition on the surface of the material to be treated. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004084005(A) 申请公布日期 2004.03.18
申请号 JP20020247013 申请日期 2002.08.27
申请人 ULVAC JAPAN LTD 发明人 NOZUE TATSUHIRO;INAGAWA KONOSUKE
分类号 C01B31/30;C23C14/06;C23C14/32 主分类号 C01B31/30
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