| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an excellent positive resist composition showing sufficient transmitting property when a light source at ≤160 nm, specifically F<SB>2</SB>excimer laser light (157 nm), is used and having a small amount of outgas. <P>SOLUTION: The positive resist composition contains: (a) a resin which contains a repeating unit having a phenyl group or a cyclohexyl group in the side chain and which is decomposed by the effect of an acid to increase the solubility with an alkali developer solution; (b) a compound which generates an acid by irradiation of active rays or radiation; and (c) a solvent. <P>COPYRIGHT: (C)2004,JPO |
