| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target which does not occur arcing, permits stable deposition, and obviates the occurrence of nodules and the deterioration of the quality of a substrate, etc., by particles. SOLUTION: The sputtering target is formed by joining a target material composed of a plurality of divided target materials and a backing plate by means of a bonding material. Horizontal portions having a thickness approximately the same as the thickness of the divided target materials of a smaller thickness are formed in the adjacent portions of the divided target materials of a larger thickness among the divided target materials, and inclined portions continuous with the upper target surfaces from the horizontal portions are formed on the divided target materials of the larger thickness. COPYRIGHT: (C)2004,JPO
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