| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas feed apparatus whereby the feeding accuracy of a treating mixed gas to a surface treating apparatus can be kept surely high. SOLUTION: In a thermostatic chamber 21 (an apparatus main body) of the gas feeding apparatus 20, there are stored a tank 22 for reserving therein a water to be vaporized (a first raw material), an MFC 23 (a first metering means) for so metering the water vapor fed from the tank 22 to obtain its desired flow rate, and the whole-length region of a metered-off-vapor pipe 25 (a first raw-material-gas passage) extended from the MFC 23. The pipe 25 is combined with a process-gas pipe 26 (a second raw-material-gas pipe), and a mixed-gas pipe 27 of a combined-off pipe continues with a surface treating apparatus 10 via an introducing pipe 13. The inside of the oven 21 is kept at a higher temperature than the vaporized temperature of the water. COPYRIGHT: (C)2004,JPO
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