发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device having a gate wiring structure of low resistance and to provide a method for manufacturing the same of high yield. SOLUTION: The nonvolatile semiconductor memory device is provided with a gate electrode where a first gate member and a second gate member are laminated on a gate insulating film. The gate member of a second layer is formed in a mushroom shape starting from the interface between the gate member of a first layer and that of the second layer. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004087788(A) 申请公布日期 2004.03.18
申请号 JP20020246646 申请日期 2002.08.27
申请人 TOSHIBA CORP;CHUBU TOSHIBA ENGINEERING KK 发明人 FUKUI TOMOHIKO;TAWARA SEIICHI
分类号 H01L21/28;H01L21/8247;H01L27/115;H01L29/423;H01L29/49;H01L29/78;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/28
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