发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device having a gate wiring structure of low resistance and to provide a method for manufacturing the same of high yield. SOLUTION: The nonvolatile semiconductor memory device is provided with a gate electrode where a first gate member and a second gate member are laminated on a gate insulating film. The gate member of a second layer is formed in a mushroom shape starting from the interface between the gate member of a first layer and that of the second layer. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004087788(A) |
申请公布日期 |
2004.03.18 |
申请号 |
JP20020246646 |
申请日期 |
2002.08.27 |
申请人 |
TOSHIBA CORP;CHUBU TOSHIBA ENGINEERING KK |
发明人 |
FUKUI TOMOHIKO;TAWARA SEIICHI |
分类号 |
H01L21/28;H01L21/8247;H01L27/115;H01L29/423;H01L29/49;H01L29/78;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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