发明名称 DRAWING SYSTEM
摘要 PROBLEM TO BE SOLVED: To draw a circuit pattern with no fault and high accuracy and to improve the work efficiency. SOLUTION: The exposure system is equipped with a laser drawing apparatus 10 to draw a circuit pattern on a substrate S. The laser drawing apparatus 10 is provided with two variable focus CCD cameras 32 and 34. The position of reference holes P1 to P4 formed in the substrate S is detected based on the image photographed by the CCD cameras 32, 34 set at low magnification, and the drawing table 14 and the CCD cameras 32, 34 are relatively moved based on the detected result to position the holes P1 to P4 in the center of the viewing field of the CCD cameras 32, 34. Further, the relative position data of the of the substrate S with respect to the drawing table 14 are obtained based on the image photographed by the CCD cameras 32, 34 set at high magnification, and the substrate S is matched to the circuit pattern on drawing based on the obtained relative position data. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004085664(A) 申请公布日期 2004.03.18
申请号 JP20020243275 申请日期 2002.08.23
申请人 PENTAX CORP 发明人 INOMATA TOSHINORI
分类号 G03F9/00;G03F7/20;(IPC1-7):G03F9/00 主分类号 G03F9/00
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