发明名称 Non-volatile memory and the fabrication method thereof
摘要 A non-volatile memory, which comprises an insulating substrate (11) that has a first electrode (18) that extends through the substrate from the front surface to the rear surface thereof; a second electrode (13) that is formed on one side of the insulating substrate (11); and a recording layer (12) that is clamped between the first electrode (18) and the second electrode (13) and whose resistance value varies when an electric pulse is applied across the first electrode (18) and the second electrode (13); wherein the insulating substrate (11) has a layered structure composed of an organic dielectric thin film (112) and an inorganic dielectric layer (111) that is thinner than the organic dielectric thin film (112); with the recording layer (12) being formed on the side on which the inorganic dielectric layer is formed. Use of this non-volatile memory increases the possible number of data writing cycles while saving power.
申请公布号 US2004051161(A1) 申请公布日期 2004.03.18
申请号 US20030646816 申请日期 2003.08.25
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TANAKA HIDEYUKI;MORIMOTO KIYOSHI
分类号 G11B9/00;G11B9/04;G11C11/22;G11C16/02;H01L27/10;H01L27/24;H01L45/00;(IPC1-7):H01L21/20;H01L29/00 主分类号 G11B9/00
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