发明名称 BOARD PROCESSING METHOD, DEVICE, AND OPEN PLATE USED FOR IT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of efficiently and uniformly forming irregularities on the surface of a board or the like used for a solar cell. <P>SOLUTION: The board processing method is carried out in such a manner wherein an open plate 13 where a large number of openings 14 are provided is installed at a surface side of a board 1 to be processed, and the surface of the board 1 is roughed by dry etching. The openings 14 provided to the open plate 13 are each formed into a shape that enables only a virtual column whose diameter is half or below as long as a distance between the open plate 13 and the surface of the board 1 to be processed to pass through the opening 14. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004087984(A) 申请公布日期 2004.03.18
申请号 JP20020249674 申请日期 2002.08.28
申请人 KYOCERA CORP 发明人 INOMATA YOSUKE
分类号 H01L21/3065;H01L31/04;(IPC1-7):H01L31/04;H01L21/306 主分类号 H01L21/3065
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