发明名称 MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a liquid crystal display having a polysilicon semiconductor layer whose surface roughness is reduced. SOLUTION: This manufacturing method of a liquid crystal display includes a step to provide a substrate, a step to form an insulating body layer on the substrate, a step to deposit an amorphous silicon layer on the insulating body layer and a step to reduce the surface roughness of the crystalized silicon layer by crystalizing the amorphous silicon layer under oxygen atmosphere. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004088103(A) 申请公布日期 2004.03.18
申请号 JP20030293320 申请日期 2003.08.14
申请人 TOPPOLY OPTOELECTRONICS CORP 发明人 SHIH CHU-JUNG;TSAI YAW-MING
分类号 H01L21/20;H01L21/26;H01L21/268;H01L21/336;H01L29/49;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/20
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