发明名称 |
MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a liquid crystal display having a polysilicon semiconductor layer whose surface roughness is reduced. SOLUTION: This manufacturing method of a liquid crystal display includes a step to provide a substrate, a step to form an insulating body layer on the substrate, a step to deposit an amorphous silicon layer on the insulating body layer and a step to reduce the surface roughness of the crystalized silicon layer by crystalizing the amorphous silicon layer under oxygen atmosphere. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004088103(A) |
申请公布日期 |
2004.03.18 |
申请号 |
JP20030293320 |
申请日期 |
2003.08.14 |
申请人 |
TOPPOLY OPTOELECTRONICS CORP |
发明人 |
SHIH CHU-JUNG;TSAI YAW-MING |
分类号 |
H01L21/20;H01L21/26;H01L21/268;H01L21/336;H01L29/49;H01L29/786;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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