| 摘要 |
PROBLEM TO BE SOLVED: To irradiate a substrate with a laser beam in a stable atmosphere of low oxygen concentration without upsizing the whole device and without making the device specific. SOLUTION: The laser annealing device 1 is provided with optical systems 15 and 16 for irradiating a substrate 2 by guiding the laser beam emitted from a laser light source, and a cell 17 provided in an optical path between the optical systems 15 and 16 and the substrate 2. The cell 17 is cylindrical, the upper part thereof is sealed with glass or the like, and the lower part is opened. The cell 17 is arranged at a position neared sufficiently to the substrate 2. In this state, nitrogen gas is injected into an inside space of the cell 17 to perform laser annealing. COPYRIGHT: (C)2004,JPO
|
