| 摘要 |
PROBLEM TO BE SOLVED: To provide a method which can form bright and smooth hardened layers on the surfaces of articles without producing nitrogen compound layers or suppressing the formation of the nitrogen compound layers to a negligible level, and can deposit the films which have excellent adhesivity and are hardly peelable even if the high-hardness compound films of TiN, TiC, SiO<SB>2</SB>, Al<SB>2</SB>O<SB>3</SB>, etc., are deposited by physical vapor deposition, chemical vapor deposition, etc., without grinding or polishing the surfaces of the articles, the compound films of MoS<SB>2</SB>etc., having excellent lubricity, etc., are deposited. SOLUTION: The articles 30, 31, and 32 are placed in an atmosphere in which gaseous nitrogen is diluted by at least gaseous hydrogen. While the gaseous nitrogen is kept at a concentration below 30vol%, the surfaces of the articles 30, 31, and 32 are subjected to a discharge and the gaseous nitrogen and various kinds of active species existing in a plasma are reacted with the articles 30, 31, and 32, thereby forming the bright and smooth hardened layers on the surfaces of the articles 30, 31, and 32. COPYRIGHT: (C)2004,JPO
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