| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fluoride ceramic which has resistance to plasma etching so as to be suitably used as a component applied in semiconductor equipment, is inexpensive, and has mechanical strength, and a method for manufacturing the same. <P>SOLUTION: The fluoride ceramic sintered compact contains Mg in an amount of ≥50 ppm and ≤5 wt.% and the balance being calcium fluoride. Further, the fluoride ceramic sintered compact contains impurities in an amount of ≤50 ppm, and has a bending strength of ≥150 MPa. The method for manufacturing the fluoride ceramic sintered compact is also provided. <P>COPYRIGHT: (C)2004,JPO |
