| 摘要 |
PURPOSE: A separable shield ring is provided to perform a plasma etching process without replacing the whole shield ring by fabricating a separable shield ring used in plasma etching equipment. CONSTITUTION: The shield ring insulates a part of the upper electrode of the plasma etching equipment that etches the surface of a substrate by using gas of a plasma state. A main body(2) is of a cavity-type disc, made of quartz and having a protrusion part(5) vertically protruding to the outer circumference. A separation unit(3) is coupled to the inner part of the main body. The inside of the separation unit has a cavity type to pass the plasma generated by the upper electrode. The main body and the separation unit are coupled to each other and the separation unit can be replaced when the separation unit is worn away.
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