| 摘要 |
PROBLEM TO BE SOLVED: To provide an ozone treatment device that can equally set the interval between a substrate and an opposed plate over the whole area in which the substrate and opposed plate face each other. SOLUTION: This ozone treatment device 1 is provided with a processing chamber 10, a cap 11 shutting up the chamber 10, and substrate supporting mechanism sections 20 and 25 having placing surfaces on which a substrate K is placed. This device 1 is also provided with an elevating/lowering device 15 which elevates and lowers the mechanism sections 20 and 25, a heater which heats the substrate K, and the opposed plate 41 facing the substrate K. In addition, this device 1 is also provided with a process gas supply head 30 provided with a nozzle 40 which discharges an ozone-containing process gas toward the substrate K, a gas supply means which supplies the process gas, and hanging mechanisms 60 and 70 which are engaged with the cap 11 and support the head 30 in a state where the head 30 is hung down from the cap 11 and, in addition, can be moved upward. Moreover, this device 1 is also provided with a contacting member 29 which comes into contact with the process gas supply head 30 or hanging mechanism 70 when the substrate supporting mechanism sections 20 and 25 are raised. COPYRIGHT: (C)2004,JPO
|
