| 摘要 |
PROBLEM TO BE SOLVED: To implant ions on the surface of a treated substrate without using an electrode antenna, to avoid a defect due to the use of the electrode antenna, to prevent drop of the processing speed due to non-use of the electrode antenna, and to uniformly form a film superior in adhesiveness on the surface of the treated substrate by overlapping pulse voltage with DC voltage. SOLUTION: The conductive treated substrate 2 is installed in a raw material gas atmosphere for plasma generation in a decompression state. Negative DC voltage against the ground potential within a range of voltage, in which electricity is not discharged, onto the treated substrate 2, and a plasma is generated to a periphery of the treated substrate. The negative high voltage pulse against the ground potential is applied to the treated substrate by overlapping the pulse with DC voltage. The ions in the plasma atmosphere are uniformly implanted on the surface of the treated substrate 2. COPYRIGHT: (C)2004,JPO
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