PROBING METHOD, PROBE, AND MECHANISM FOR REDUCING/PLASMA ETCHING ELECTRODE
摘要
<p>A probing method comprising a step for reducing the electrode of a wafer W using a forming gas, and a step for contacting a probe pin (14A) with the electrode in a dry atmosphere. Prior to reducing the electrode P of an article under inspection, the article is heated in an inert gas atmosphere and reduction is carried out by contacting a reducing gas with the electrode of the article under inspection under a normal pressure.</p>
申请公布号
WO2004023547(A1)
申请公布日期
2004.03.18
申请号
WO2003JP11165
申请日期
2003.09.01
申请人
OCTEC INC.;TOKYO ELECTRON LIMITED;OKUMURA, KATSUYA;KOMATSU, SHIGEKAZU;ABE, YUICHI;FURUYA, KUNIHIRO;VEZIN, VINCENT;KUBO, KENICHI