发明名称 PROBING METHOD, PROBE, AND MECHANISM FOR REDUCING/PLASMA ETCHING ELECTRODE
摘要 <p>A probing method comprising a step for reducing the electrode of a wafer W using a forming gas, and a step for contacting a probe pin (14A) with the electrode in a dry atmosphere. Prior to reducing the electrode P of an article under inspection, the article is heated in an inert gas atmosphere and reduction is carried out by contacting a reducing gas with the electrode of the article under inspection under a normal pressure.</p>
申请公布号 WO2004023547(A1) 申请公布日期 2004.03.18
申请号 WO2003JP11165 申请日期 2003.09.01
申请人 OCTEC INC.;TOKYO ELECTRON LIMITED;OKUMURA, KATSUYA;KOMATSU, SHIGEKAZU;ABE, YUICHI;FURUYA, KUNIHIRO;VEZIN, VINCENT;KUBO, KENICHI 发明人 OKUMURA, KATSUYA;KOMATSU, SHIGEKAZU;ABE, YUICHI;FURUYA, KUNIHIRO;VEZIN, VINCENT;KUBO, KENICHI
分类号 G01R1/06;G01R31/28;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01R1/06
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