| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical film of an extremely thin film thickness with a sufficient antifouling function without damaging transparency as the optical film and its manufacturing method and to provide an optical film of an excellent antireflection effect provided with an antifouling layer on the outermost layer and an antireflection layer and its manufacturing method. <P>SOLUTION: In this manufacturing method of the optical film, a plasma discharge processor is used, a reaction gas for antifouling layer formation is supplied between counter electrodes, a high frequency voltage is applied to the counter electrodes, a plasma discharge processing is applied under the atmospheric pressure or a pressure close to it to a base material transferred between the counter electrodes to thereby form the antifouling layer on the base material. The high frequency voltage has components in which the voltage component of a first frequency ω<SB>1</SB>and the voltage component of a second frequency ω<SB>2</SB>higher than the first frequency ω<SB>1</SB>are superposed. <P>COPYRIGHT: (C)2004,JPO |
