| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for micromachining a substrate by using a magnetic pattern. SOLUTION: The micromachining method of the substrate includes each step for forming a magnetic film on the substrate, adding a desired magnetic pattern to the magnetic film, sprinkling magnetic powder onto the magnetic film where the magnetic pattern is given, selectively concentrating the magnetic powder according to the magnetic pattern, and performing reactive ion etching with the centrally arranged magnetic powder as a mask. The magnetic pattern is made, for example, by using a magnetic head that is modulated according to the data to be written while rotating the substrate. COPYRIGHT: (C)2004,JPO
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